EC ENGR 201D

Design in Nanoscale Technologies

Description: Lecture, four hours; outside study, eight hours. Enforced requisite: course 115C. Challenges of digital circuit design and layout in deeply scaled technologies, with focus on design-manufacturing interactions. Summary of large-scale digital design flow; basic manufacturing flow; lithographic patterning, resolution enhancement, and mask preparation; yield and variation modeling; circuit reliability and aging issues; design rules and their origins; layout design for manufacturing; test structures and process control; circuit and architecture methods for variability mitigation. Letter grading.

Units: 4.0
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